Optimization of the Automated Spray Layer-by-Layer Technique for THin Film Deposition
نویسنده
چکیده
The operational parameters of the automated Spray-LbL technique for thin film deposition have been investigated in order to-identify their effects on film thickness and roughness. We use the automated Spray-LbL system developed at MIT by the Hammond lab to build 25 bilayer films of poly (ally amine hydrochloride) (PAH) and poly (acrylic acid) (PAA). Each of the 10 operational parameters of this system are explored individually to isolate each parameter's effect on film thickness and roughness. The parameter effects are analyzed for apparent trends to determine the parameters best suited for adjusting film thickness and roughness. The optimal parameters for thickness adjustment are polyelectrolyte solution concentration, polyelectrolyte spray time, spraying distance, air pressure and polyelectrolyte charge density. These parameters are independent of the type of species used to construct the film, and thus the trends should apply to any species used to construct thin films. The effect of each of the 10 operational parameters is examined in detail. While researching the parameter effects, polyelectrolyte interdiffusion in the films was observed. This interdiffusion is investigated using both the conventional dipped LbL and Spray-LbL deposition techniques. Interdiffusion is shown to be dependent on 3 factors, the charge density of the polyelectrolytes, the molecular weight of the polyelectrolytes, and the contact time between the polyelectrolyte solutions and the surface of the film. Interdiffusion is observed when the PAH is partially charged, the polyelectrolytes chains have a low molecular weight, and the contact time is sufficiently long enough to allow for interdiffusion. The significantly reduced contact time during the automated Spray-LbL process not only speeds up the film deposition time, but also significantly hinders the interdiffusion of PAH resulting in much thinner films than what is possible from dipping. Finally, the uniformity of the films produced using the automated Spray-LbL system is investigated. Films deposited on substrates greater than 1 in diameter area exhibit more than 20% variance in thickness. Adjustments were made to the setup of the system in an effort to expand this area of film thickness uniformity. However, it is determined that the design of this automated Spray-LbL system limits the film uniformity to an area of 1 in diameter. Thesis Supervisor: Paula T. Hammond Title: Bayer Chair Professor of Chemical Engineering and Executive Officer To my family, Natalie, Cole, Alli, Avery, and Cooper. You make life worth living and I love you all.
منابع مشابه
Optimization of Annealing Process for Totally Printable High-current Superstrate CuInS2 Thin-Film Solar Cells
Planar superstrate CuInS2 (CIS) solar cell devices are fabricated using totally solution-processed deposition methods. A titanium dioxide blocking layer and an In2S3 buffer layer are deposited by the spray pyrolysis method. A CIS2 absorber layer is deposited by the spin coating method using CIS ink prepared by a 1-butylamine solvent-based solution at room temperature. To obtain optimum annealin...
متن کاملProcess Optimization of Deposition Conditions for Low Temperature Thin Film Insulators used in Thin Film Transistors Displays
Deposition process for thin insulator used in polysilicon gate dielectric of thin film transistors are optimized. Silane and N2O plasma are used to form SiO2 layers at temperatures below 150 ºC. The deposition conditions as well as system operating parameters such as pressure, temperature, gas flow ratios, total flow rate and plasma power are also studied and their effects are discussed. The p...
متن کاملCharacterization of nanostructured SnO2 thin film coated by Ag nanoparticles
Nanostructured SnO2 thin films were prepared using Electron Beam-Physical Vapor Deposition (EB-PVD) technique. Then Ag nanoparticles synthesized by laser-pulsed ablation were sprayed on the films. In order to form a homogenous coated of SnO2 on the glass surface, it was thermally treated at 500°C for 1 h. At this stage, the combined layer on the substrate was completely dried for 8 h in the air...
متن کاملPreparation and growth of SnS thin film deposited by spray pyrolysis technique
In this paper thin films of tin sulfide (SnS) were deposited on the glass substrates using spray pyrolysis method with the substrate temperatures in the range of 400–600℃, keeping the other deposition parameters constant. In this work the characteristic of SnS thin films investigated. The XRD pattern and optical transmittance of thin films also are discussed. With the change in concen...
متن کاملA Method for Simulating Spray Pyrolysis Deposition in the Level Set Framework
The ability to deposit a thin tin oxide film on CMOS chip dies has enabled the manufacture of modern smart gas sensor devices. Spray pyrolysis deposition is used to grow the required thin films, as it is an affordable deposition technique which can be integrated into a standard CMOS processing sequence. A model for spray pyrolysis deposition is developed and implemented within the Level Set fra...
متن کامل